Apatite Formation on Rutile TiO<sub>2</sub> Film Deposited Using Dual Cathode DC Unbalanced Magnetron Sputtering
Rutile TiO2 films were deposited on unheated stainless steel type 316L using dual cathode DC unbalanced magnetron sputtering. The effects of deposition time ranging 30, 60, 90, and 120 mins on the films structure were investigated. Moreover, all the samples were immersed in SBF for period times of 3 and 5 days also considered. The crystal structures were characterized by thin film X-ray diffraction (TF-XRD). The filmâ€™s thickness and surface morphology were evaluated using atomic force microscopy (AFM). The crystallinity, roughness, thickness, and grain size of rutile with only (110) plane increased with increased deposition time. After immersed samples in SBF for 3 day the highest and moderate crystallinity of apatite was observed on the 30 min and 90 min, respectively. However, the films deposited with 60 and 120 min cannot be observed the peak of apatite. An increase crystallinity of apatite clearly observed when after immersed in SBF for 5 day.
Authors who publish with Engineering Journal agree to transfer all copyright rights in and to the above work to the Engineering Journal (EJ)'s Editorial Board so that EJ's Editorial Board shall have the right to publish the work for nonprofit use in any media or form. In return, authors retain: (1) all proprietary rights other than copyright; (2) re-use of all or part of the above paper in their other work; (3) right to reproduce or authorize others to reproduce the above paper for authors' personal use or for company use if the source and EJ's copyright notice is indicated, and if the reproduction is not made for the purpose of sale.